基于自主研制的72通薄片泵浦模块进行了克尔透镜锁模薄片激光技术研究。首先，分析了薄片克尔透镜锁模原理。然后，基于ABCD矩阵和孤子锁模理论设计了谐振腔。最后，基于72通泵浦模块进行了克尔透镜锁模谐振腔飞秒脉冲实验研究，当泵浦功率为72 W时，获得了平均功率为11.78 W、脉冲宽度为243 fs、重复频率为81.45 MHz的飞秒脉冲输出；优化腔型后，在94 W泵浦时得到了22.33 W的输出功率，脉冲宽度为394 fs。

基于自主研制的24通薄片泵浦模块,开展了高重复频率、窄脉宽、高光束质量的腔倒空激光技术研究。首先,基于朗伯-比尔定律,计算了不同厚度的薄片晶体的吸收效率和泵浦多通数之间的关系;其次,基于准三能级速率方程,计算了阈值泵浦功率、连续输出功率与输出镜透过率的关系,并对腔倒空谐振腔中光子数密度随时间的变化规律进行了研究。最后,采用该多通泵浦模块进行了连续出光实验,获得了输出功率为94.1 W的1030 nm连续p偏振激光输出,其光-光转化效率为52.28%,斜率效率为60%,光束质量为 Mx2=2.05, My2=1.93的基模输出;不改变腔型结构,插入普克尔盒和1/4波片,获得了脉冲宽度为7.43 ns,重复频率为100 kHz的1030 nm脉冲输出,平均输出功率为65.4 W,光-光效率为36.33%,斜效率为45%,光束质量 Mx2=2.37, My2=2.20。

Residual stress, which can be inevitably introduced during the optical films deposition process, must be controlled in many applications since the surface deformation is caused. The residual stress is traditionally controlled by adjusting the process parameters. However, the process parameters are determined by other more desired properties in many fields. In these cases, layer structure is the only variable to change the residual stress status of the components. Ta2O5/SiO2 is most commonly used material pair in visible/near infrared (VIS/NIR) region. In this letter, stress behaviors of Ta2O5 and SiO2 single layers deposited by ion-assisted deposition (IAD) are studied. Stress-thickness linear correlation curves of the two materials are obtained, which agree with the commonly reported linear results. Based on these features, a kind of antireflection (AR) coating acted as back side coating is designed to control the residual stress of components by the layer structure designing. A series of AR coatings at 1 319 nm are designed, according to residual stress status desired to introduce.

A fine layer structure in the Ni/C multilayer (3-4 nm/6-7 nm) is deposited by magnetic sputtering by combining soft X-ray resonant reflectivity curve at 4.48 nm and grazing incidence X-ray reflectivity (GIXR) curve at 0.14 nm. It is found that the thickness of Ni-on-C interface is much rougher than C-on-Ni interface. By analyzing the optical constants, it shows that the interface in the Ni/C multilayer that of system is a mixture of Ni and C atoms; the Ni and C in multilayer system have excellent stability, and no interlayer is formed.

使用倾角电子束蒸发技术制备了TiO2雕塑薄膜, 通过对雕塑薄膜在不同退火温度和退火时间下进行热处理, 发现热处理工艺可以优化薄膜的双折射特性和相位延迟性能。实验结果表明, TiO2雕塑薄膜的最佳退火条件为500 ℃下处理4 h, 其双折射值达0.115左右, 远高于未处理时的最大双折射值(0.06)。椭偏仪测试结果表明, 最优条件下热处理后的薄膜, 在550 nm处相位延迟量达90°, 可以作为该波长处的λ/4波片使用。因此, 热退火是改善雕塑薄膜双折射性能的一种简单实用的方法。